Characterization of TiCN thin films deposited by Dc-Pulsed PACVD using methane precursor

COMPARISON OF PROPERTIES OF TiN/TiCN AND PLASMA NITRIDING/TiCN FILMS DEPOSITED ON THE TOOL STEEL BY PULSED DC- PACVD

In this work, TiN/TiCN & PN/TiCN multilayer films were deposited by plasma- assisted chemical vapour deposition (PACVD). Plasma nitriding (PN) and TiN intermediate layer prior to coating leads to appropriate hardness gradient and it can greatly improve the mechanical properties of the coating. The composition, crystalline structure and phase of the films were investigated by X-ray d...

AlNXOY THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resis...

Superhard NbB2-x thin films deposited by dc magnetron sputtering

We have deposited weakly textured substoichiometric NbB2-x thin films by magnetron sputtering from a NbB2 target. The films exhibit superhardness (42 ± 4 GPa), previously only observed in overstoichiometric TiB2 thin films, and explained by a self-organized nanostructuring, where thin TiB2 columnar grains hinder nucleation and slip of dislocations and a B-rich tissue phase between the grains pr...

Growth and Characterization of Germanium-based type I Clathrate Thin Films Deposited by Pulsed Laser Ablation

Thin films of clathrate material have been grown using the laser ablation technique on a variety of substrates. Films deposited on silicon substrates exhibited a significant deficiency of Ga and Ge while the stoichiometry was preserved in films deposited on quartz, sapphire, and glass substrates. Ablation characteristics of the clathrate target for laser radiation at three different wavelengths...

Characterization of amorphous and nanocomposite Nb–Si–C thin films deposited by DC magnetron sputtering